Product
Modification
Modification
| Before | After | |
|---|---|---|
|
|
|
|
| Equipment | Process | OEM P/N |
|---|---|---|
|
Product |
SOURCE FAN_OPUS |
|
|
MODEL |
4715KL-05W-B49 |
|
|
Application |
ETCH AMAT OPUS |
|
|
SPEC |
DC 24V / 0.46A |
|
|
Main Supply Contractor |
SK-Hynix |
|
|
Product description |
Improvements Increased RPM of the existing fan: 3150 → 3700 Increased the number of fans from 2 to 5 Sealed parts of the two existing fan to improve air circulation in the chamber Improvement effect Enhancement of uniformity in the wafer process map No more polymer formation between lid heater and ceramic plate |
| Classification | Description |
|---|---|
|
Product |
TiCL4 DLI & Gate V/V Controller |
|
Material |
Etc |
|
Application |
TEL TiCL4 equipment |
|
Oper. Temp. |
Max. 150~200℃ |
|
Main Supply Contractor |
SK-Hynix |
|
Product description |
Used to prevent TiCL4 supply component (MFM + VC) blockage and gate valve vacuum leakage due to PM temp down in TEL TRIAS equipment for Ti/TiN Dep process Controls temperature so that PM MFM, VC, and Gate V/V Ass'y can always maintain the setting temp (operating temperature: 0~200°C available) |